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Fully Automatic Roll-to-Plate Imprinting Line for High-Throughput Nanoimprint Lithography with Customizable Pressure

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Dongguan Osmanuv Machinery Equipment Co., Ltd

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Fully Automatic Roll-to-Plate Imprinting Line for High-Throughput Nanoimprint Lithography with Customizable Pressure

Name: Fully Automatic RolltoPlate Imprinting Line for HighThroughput Nanoimprint Lithography with Customizable Pressure
Brand: OSMANUV
Price: 1 USD

Quality Fully Automatic Roll-to-Plate Imprinting Line for High-Throughput Nanoimprint Lithography with Customizable Pressure for sale

Brand Name : OSMANUV

Model Number : Specification

Certification : ISO9001

Place of Origin : CHINA

MOQ : 1 set

Price : Negotiation

Payment Terms : T/T

Supply Ability : Negotiation

Delivery Time : 30-45days

Packaging Details : WOOD PACKAGING

Coating Speed : High Speed

Rubber Diameter : 100mm

Packing : standard wooden case

Working Width : 600/1000/1300

Dosing Roller : 164mm*1450mm

Power : 45Kw

Roller Qty : 2 pcs

Electric Box : independent electric box

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FULLY AUTOMATIC ROLL-TO-PLATE IMPRINTING LINE – HIGH-VOLUME NANOIMPRINT LITHOGRAPHY FOR OPTICS & DISPLAY

Product Overview

This imprinting production line is designed for high-throughput, high-resolution replication of micro/nanostructures using UV nanoimprint lithography (NIL) or thermal imprinting. It supports rigid substrates (silicon, glass, metal) and flexible films (PET, PI, PEN). The system integrates coating, alignment, imprinting, curing, and demolding. Imprinting pressure, temperature, UV dose, and number of stations are fully customizable for various resin systems and pattern sizes.

Technical Specifications

Parameter	Standard Value / Range	Customization Option
Imprint technology	UV-NIL / Thermal NIL	Hybrid UV+thermal customizable
Max substrate size	300 mm × 300 mm (square) / 8″ wafer	Customizable up to 500 ×500 mm
Imprint pressure	0.5 - 10 bar	Customizable up to 50 bar
Temperature range (thermal)	RT - 200°C	Customizable up to 350 °C
UV intensity	50 - 500 mW/cm²	Customizable wavelength & intensity
Alignment accuracy	± 5 μm (std) / ± 0.5 μm (high-precision)	Customizable optical alignment
Production throughput	60 - 120 substrates/hour	Depends on customizable cycle time
Imprint area uniformity	≥ 95%	Customizable multi-zone pressure control
Power supply	AC 400V / 50Hz (3-phase)	Customizable to 480V / 60Hz

Applications

Diffractive optical elements (DOE) & metalenses
Augmented reality (AR) / virtual reality (VR) waveguide manufacturing
Anti-reflective (AR) & hydrophobic surfaces
Biomedical microfluidic devices
Flexible electronics & printed sensors
Customizable for large-area display optical films

Customization Options

We provide full production line customization including:

Number of imprint stations (single‑stage to multi‑step)
Substrate transfer method (robot, conveyor, roll-to-roll)
Resin dispensing type (spin, slot-die, spray - customizable)
Imprint stamp (soft PDMS, hard quartz, Ni shim) - customizable stamp docking
Cleanroom integration (ISO 5 to ISO 8 - customizable)
Factory automation interface (SECS/GEM, OPC UA - customizable)

Key Features

High residual layer uniformity < ± 5%
Low imprint force option for fragile stamps
Real‑time force & temperature feedback control
Automatic stamp cleaning cycle (customizable interval)
Recipe‑based operation with barcode or RFID tracking
Customizable safety enclosure & light curtains

Support and Services

Global remote diagnostics (VPN / secure tunnel)
On‑site commissioning & operator training (up to 5 days included)
Process transfer support - resin & stamp supplier matching
Customizable maintenance contract (quarterly / semi‑annual)
24‑month warranty on imprinting chamber & actuators

Packing and Shipping

Anti‑vibration crate with humidity control
Vacuum‑sealed desiccant bags for critical optics
Shipping: FOB or CIF - customizable pallet labeling & export packaging
Lead time: standard 6 weeks, customized lines 10 -14 weeks

Frequently Asked Questions

Q1: Can I imprint 3D multi‑level structures?

A: Yes - multi‑step imprinting with alignment is customizable.

Q2: Does it support roll‑to‑roll?

A: The standard is roll‑to‑plate; full R2R configuration is customizable.

Q3: Can I use my own UV resin?

A: Yes - UV intensity, exposure time and atmosphere (N₂ purge) are programmable and customizable.

Product Tags:

Fully Automatic Roll-to-Plate Imprinting Line for High-Throughput Nanoimprint Lithography with Customizable Pressure Images

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Fully Automatic Roll-to-Plate Imprinting Line for High-Throughput Nanoimprint Lithography with Customizable Pressure

Fully Automatic Roll-to-Plate Imprinting Line for High-Throughput Nanoimprint Lithography with Customizable Pressure

fully automatic nanoimprint lithography machine

roll-to-plate UV coating machine

customizable pressure imprinting line

Fully Automatic Roll-to-Plate Imprinting Line for High-Throughput Nanoimprint Lithography with Customizable Pressure Images